Publications

Research Publications

  1. “Aluminum Dihydride Complexes and Their Unexpected Application in the Atomic
    Layer Deposition of Titanium Carbonitride Films,” K. J. Blakeney, P. D. Martin, and C.
    H. Winter, Dalton Trans. 2018, in press, DOI: 10.1039/C8DT02508H

  2. “Atomic Layer Deposition of Tungsten-Rich Tungsten Carbide Films using WCl6 and
    AlH2(tBuNCH2CH2NMe2) as Precursors,” K. J. Blakeney, C. L. Ward, and C. H. Winter,
    ECS Trans. 2018, in press.

  3. “Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films,” M.
    M. Kerrigan, J. P. Klesko, K. J. Blakeney, C. H. Winter, ACS Appl. Mater. Interfaces
    2018, 10, 14200–14208. DOI: 10.1021/acsami.8b03074

  4. “Atomic Layer Deposition of Aluminum Metal Films Using a Thermally Stable
    Aluminum Hydride Reducing Agent,” K. J. Blakeney and C. H. Winter, Chem. Mater.
    2018, 30, 1844–1848. DOI: 10.1021/acs.chemmater.8b00445

  5. “Thermal atomic layer deposition of tungsten carbide films from WCl6 and AlMe3,” K. J.
    Blakeney and C. H. Winter, J. Vac. Sci. Technol. A 2018, 36, 01A104. DOI:
    10.1116/1.5002667

  6. “Synthesis, structural characterization, and volatility evaluation of zirconium and
    hafnium amidate complexes,” M. C. Karunarathne, J. W. Baumann, M. J. Heeg, P. D.
    Martin, C. H. Winter, J. Organomet. Chem. 2017, 847, 204–212. DOI:
    10.1016/j.jorganchem.2017.03.003

  7. “Low Temperature, Selective Atomic Layer Deposition of Cobalt Metal Films Using
    Bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and Alkylamine Precursors,” M. M.
    Kerrigan, J. P. Klesko, C. H. Winter, Chem. Mater. 2017, 29, 7458–7466. DOI:
    10.1021/acs.chemmater.7b02456

  8. “Photoactive Zinc Ferrites Fabricated via Conventional CVD Approach,” D. Peeters, D.
    H. Taffa, M. M. Kerrigan, A. Ney, N. Jöns, D. Rogalla, S. Cwik, H.-W. Becker, M.
    Grafen, A. Ostendorf, C. H. Winter, S. Chakraborty, M. Wark, A. Devi, ACS Sustainable
    Chem. Eng. 2017, 5, 2917–2926. DOI: 10.1021/acssuschemeng.6b02233

  9. “Substrate Selectivity in the Low Temperature Growth of Cobalt Metal Films from
    Bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and Formic Acid,” M. M. Kerrigan, J. P.
    Klesko, S. M. Rupich, C. L. Dezelah, R. K. Kanjolia, Y. J. Chabal, C. H. Winter, J.
    Chem. Phys. 2017, 146, 052813. DOI: 10.1063/1.4968848

  10. “Energetic Materials Trends in 5- and 6-Membered Cyclic Peroxides Containing
    Hydroperoxy and Hydroxy Substituents,” N.-D. H. Gamage, B. Stiasny, E. G. Kratz, J.
    Stierstorfer, P. D. Martin, G. A. Cisneros, T. M. Klapötke, C. H. Winter, Eur. J. Inorg.
    Chem. 2016, 5036–5043. DOI: 10.1002/ejic.201600767

Invited Review Articles

  1. T. J. Knisley, L. C. Kalutarage, and C. H. Winter, “Precursors and Chemistry for the Atomic Layer Deposition of Metallic First Row Transition Metal Films,” Coord. Chem. Rev. 2013, 257, 3222-3231. (10.1016/j.ccr.2013.03.019)
  2. C. H. Winter, T. J. Knisley, L. C. Kalutarage, M. A. Zavada, J. P. Klesko, T. H. Perera, “Metallic Materials Deposition: Metal-Organic Precursors,” Encyclopedia of Inorganic and Bioinorganic Chemistry, Wiley, 2012, 1-25. (10.1002/9781119951438.eibc0128.pub2)
  3. C. H. Winter, W. Zheng, and H. M. El-Kaderi, “Metallic Materials Deposition: MetalOrganic Precursors,” Encyclopedia of Inorganic Chemistry-II, Wiley: Chichester, 2005, Volume 5, pp. 3121-3144.
  4. C. H. Winter, “The Chemical Vapor Deposition of Metal Nitride Films Using Modern Metalorganic Precursors,” Aldrichimica Acta 2000, 33, 3-8.
  5. C. H. Winter, “Precursors for the Chemical Vapor Deposition of Titanium Disulfide and Titanium Nitride Films, Materials Synthesis and Characterization, Perry, D. L., Ed.; Plenum Press: New York, 1997, pp 115-129.
  6. “Permetalated Aromatic Compounds,” C. H. Winter, K. N. Seneviratne, and A. Bretschneider-Hurley, Comments on Inorganic Chemistry 1996, 19, 1.
  7. “Thin Films of Early Transition Metal Monophosphides: A Fertile Field?,” T. S. Lewkebandara and C. H. Winter, Adv. Mater. CVD 1996, 2, 75.
  8. “MOCVD of Lanthanide Materials: Applications and Opportunities,” T. S. Lewkebandara and C. H. Winter, Chemtracts: Inorg. Chem. 1995, 6, 271.
  9. “MOCVD Precursors to Metal Oxide, Nitride, and Sulfide Films,” C. H. Winter, Strem Chemiker 1994, 15, 1.
  10. “Chemical Vapor Deposition Routes to Titanium Disulfide Films,” T. S. Lewkebandara and C. H. Winter Adv. Mater. 1994, 6, 237.